HPA-M-HT | 5N Purity Alumina


Main features
  • 5N purity (99.999%)
  • 2 - 6um particle size
  • Low impurity levels (Si, Fe, Ca)

Product Description

HPA-M-HT is an alumina powder of the highest purity, boasting a 5N (99.999%) purity level. It has an irregular particle shape and a surface area of 4-8 m²/g. This advanced material is meticulously crafted to satisfy the rigorous requirements of semiconductor manufacturing, delivering unmatched performance in applications that demand high temperature and high purity. The D50 particle size is in the range of 2-6 µm, ensuring consistent performance across various processes.

HPA-M-HT comes with irregularly shaped particles, bringing several benefits to different applications. The irregular shape improves packing density and surface contact, leading to better performance in high-temperature settings where steady thermal management is crucial. This feature makes HPA-M-HT especially useful in thermal interface materials, where maximizing surface contact is vital for effective heat dissipation. Moreover, the alpha phase of this alumina powder offers excellent thermal stability, mechanical strength, and chemical resistance. These properties make it suitable for semiconductor wafer polishing, electronic substrate production, and high-performance ceramic parts. The alpha phase’s natural qualities ensure the material keeps its structure and functionality under extreme conditions, enhancing the reliability and lifespan of the final products.

Product Family
HPA-M-HT  
1kg Box

Catalog Product

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Technical Specifications

General Properties
Density (g) 0.3 - 0.5 g/cm3
Morphology Irregular
Particle size (D50) 2 - 6 um
Purity 99.999 %
Surface Area 4 - 8 m2/g
Chemical Properties
Phase a
Other Properties
Impurities
Calcium (Ca) 3 ppm
Iron (Fe)
Iron (Fe)
A chemical element with a melting point of 1,538 C
3 ppm
Silicon (Si) 4 ppm
Sodium (Na) 10 ppm

Additional Information

Purity Na Mg Si Ca Ti Cu Cr Fe K
5N(99.999%) <4 <1 <3 <3 <0.5 <0.5 <1 <1 <0.5

 

Where can I use HPA-M-HT Ultra High purity Alumina?


Semiconductor manufacturing

HPA-M-HT is crucial for semiconductor manufacturing, where ultra-high purity is essential. Its minimal impurity levels help prevent contamination, which is vital for maintaining high yield rates and device reliability. The material’s thermal stability makes it suitable for high-temperature processes, minimizing the risk of defects due to thermal expansion or chemical reactions.

 

Optoelectronics

The outstanding purity and controlled particle size distribution of HPA-M-HT make it perfect for optoelectronic components, where even slight impurities can affect performance. The high dielectric strength and thermal conductivity of this alumina enhance the efficiency and reliability of optoelectronic devices.

Technical ceramics

HPA-M-HT’s high purity and controlled morphology improve the mechanical properties of advanced technical ceramics. These ceramics are used in applications requiring high strength, wear resistance, and chemical inertness, such as substrates, insulators, and cutting tools.

HPA-M-HT is produced using advanced manufacturing techniques to achieve its ultra-high purity and consistent quality. Our cutting-edge processing technology ensures that each batch meets the high standards required by high-tech industries. We also offer customizable solutions to adjust the material’s properties for specific applications, providing tailored support and collaborative R&D partnerships to optimize performance.

alpha phase alumina

Importance of Alpha Phase Alumina in Semiconductor Manufacturing

Alpha phase alumina (α-Alumina) is essential in semiconductor manufacturing due to its exceptional properties that meet the industry's rigorous demands. Here’s why alpha alumina is so important in semiconductor applications:

  1. Thermal Stability and Conductivity:

    • Alpha alumina's exceptional thermal stability ensures it can endure the high temperatures used in semiconductor processing without losing its form or function. This is crucial for maintaining the performance and integrity of semiconductor devices.
    • Excellent thermal conductivity of alpha alumina allows for effective heat dissipation. Proper heat management is critical in semiconductor devices to prevent overheating, which can cause device malfunctions.
  2. Electrical Insulation:

    • Alpha alumina has superior electrical insulation properties, making it perfect for substrates and insulating layers within semiconductor devices. This helps in preventing electrical interference and ensures consistent performance of semiconductor components.
  3. Mechanical Strength and Hardness:

    • The high mechanical strength and hardness of alpha alumina are advantageous in withstanding mechanical stresses during wafer processing and handling. This durability helps maintain the precision and quality of semiconductor wafers throughout manufacturing.
  4. Chemical Inertness:

    • Alpha alumina's chemical inertness is vital in semiconductor manufacturing, where materials must resist corrosion and chemical attacks from reactive gases and chemicals used in etching and cleaning processes. This ensures long-term reliability and performance of semiconductor components.
  5. Purity Levels:

    • High-purity alpha alumina (up to 99.999%) is crucial for minimizing contamination in semiconductor devices. Impurities like metal ions can act as contaminants that introduce defects in semiconductor materials, leading to device failure. Alpha alumina's high purity levels help reduce contamination risks and enhance device yield and reliability.

 

Properties and Importance in Semiconductor Manufacturing

Property Importance in Semiconductor Manufacturing
Thermal Stability Maintains structural integrity at high processing temperatures
Thermal Conductivity Efficient heat dissipation to prevent overheating of semiconductor devices
Electrical Insulation Prevents electrical interference, ensuring reliable performance
Mechanical Strength Withstands mechanical stresses, maintaining wafer precision and quality
Chemical Inertness Resists corrosion and chemical attacks during etching and cleaning processes
High Purity Levels Minimizes contamination risks, reducing defects and improving device yield

 

To summarize, alpha phase alumina is crucial in semiconductor manufacturing due to its unique combination of thermal stability, thermal conductivity, electrical insulation, mechanical strength, chemical inertness, and high purity levels. These properties ensure that semiconductor devices are produced with high precision, reliability, and performance, making alpha alumina a key material in advancing semiconductor technology.

5N Alpha phase Alumina in Thermal interface materials

Alpha phase alumina particles are also very important for thermal interface material fillers. Their inherent thermal stability and high thermal conductivity make them ideal for efficient heat dissipation. The mechanical strength of alpha phase alumina ensures that the fillers maintain structural integrity under high thermal stress, providing reliable performance over time. Additionally, the chemical resistance of alpha phase particles helps them withstand harsh environments without degrading, which is crucial for maintaining the effectiveness of thermal interface materials in demanding applications. This makes alpha phase alumina a preferred choice for enhancing the performance and durability of thermal management solutions.

Having said that, the purity of alumina is another important factor and typically you can get away with lower purity options while also getting similar thermal performance. While 5N purity alumina offers the best performance and reliability due to its high thermal conductivity and minimal impurities, cheaper options with lower purity levels can also be used effectively in less demanding thermal management applications. The choice depends on the balance between performance requirements and budget constraints.

High purity Alumina with low sodium (Na) levels purpose

Polar alumina offers extremely low sodium levels (below 10 ppm), a significant advantage over competitors (100+ ppm), especially important in applications where minimizing heat transfer is critical. Low sodium levels is specifically valuable in applications where electrical insulation and chemical stability are critical. Sodium, being an alkali metal, can act as a contaminant that degrades the performance of sensitive electronic components. In thermal interface materials (TIMs), HPA with low sodium content minimizes ion migration, which could otherwise lead to electrical leakage, corrosion, or failure of components over time. This makes low-sodium HPA highly suitable for use in semiconductors, LED manufacturing, and other high-performance electronic systems where reliability and longevity are key requirements.

Customized 5N Product: Densification process

5N powder is critical for thermal management in AI chips due to its low uranium and thorium content. The alumina is densified to optimize performance in TIMs and mold compounds.